180 nanometer

Semiconductor manufacturing processes

10 µm – 1971 6 µm – 1974 3 µm – 1977 1.5 µm – 1982 1 µm – 1985 800 nm – 1989 600 nm – 1994 350 nm – 1995 250 nm – 1997 180 nm – 1999 130 nm – 2001 90 nm – 2004 65 nm – 2006 45 nm – 2008 32 nm – 2010 22 nm – 2012 14 nm – 2014 10 nm – 2016 7 nm – ~2018 5 nm – ~2020
Half-nodes

The 180 nanometer (180 nm) process refers to the level of semiconductor process technology that was reached in the 1999-2000 timeframe by most leading semiconductor companies, like Intel, Texas Instruments, IBM, and TSMC.

The origin of the 180 nm value is historical, as it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS).

Some of the first CPUs manufactured with this process include Intel Coppermine family of Pentium III processors. This was the first technology using a gate length shorter than that of light used for lithography (which has a minimum of 193 nm).

Some more recent microprocessors and microcontrollers (e.g. PIC) are using this technology because it is typically low cost and does not require upgrading of existing equipment.

Processors using 180 nm manufacturing technology

Intel Coppermine E- October, 1999
AMD Athlon Thunderbird - June 2000
Intel Celeron (Willamette) - May, 2002
Motorola PowerPC 7445 and 7455 (Apollo 6) - January, 2002
Radeon R100 and RV100 Radeon 7000 - 2000

Preceded by 250 nm	CMOS manufacturing processes	Succeeded by 130 nm

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